Plasma etching is a form of plasma processing designed to remove material from a sample using plasma discharges. It is highly controllable and can be used to etch a wide variety of materials. The most commonly used form of plasma etching is referred to in the microfabrication world as reactive ion etching RIE. However, there are other types of plasma etching, including plasma ashing and ion milling. For a detailed overview of plasma etching in the LNF, please review the technology workshop.